Steam cleaning technology began with photoengraving, resist stripping after etching process, polymer removal.
In addition to usual cleaning capacity, we aim for low cost, clean, low damage, and environmentally friendly cleaning.
And now we are expanding this technology to applications other than semiconductors.

●　Steam stripper
Resist and polymer peeling apparatus using steam without using chemical liquid.
●　Damage-less, clean process that meets the requirements of the nanotechnology era.
●　Cost can be drastically reduced because no chemicals are used.
●　Reduce the number of processes and shorten TAT by single wafer calibration.
●　Eco-friendly process meeting the needs of the times.